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91.
Thin film materials are widely used in the fabrication of semiconductor microelectronic devices. In thin film deposition, cleanliness of substrate surface have become critically important as over 50% of yield losses in integrated circuit fabrication are caused by microcontamination [1]. There are many wafer cleaning techniques. The most successful approach for silicon wafer cleaning technique is RCA clean [2]. But for glass substrate it is still not known which procedure of cleaning is the best. This paper provides an understanding of the right way of glass wafer cleaning method, with a focus towards identifying good bond strength. Two wafer cleaning techniques have been used for cleaning glass substrates in the context of laser micro-joining of dissimilar substrates. First cleaning procedure involves two steps, first cleaning in acetone solution and then in DI water solution. After each step dried with N2. Second cleaning procedure involves four steps, first cleaning with 1% Alconox solution, second in DI water, third in acetone solution and finally in a methanol solution and dried with N2 after each step. Deposition of Ti thin film on top of these two types of substrate using DC magnetron sputtering method also showed better adhesion of Ti film on glass for the second type of cleaning method. Scanning electron microscopy (SEM) analyses of the lap shear tested failed surfaces for these two kinds of samples revealed strong bond for samples prepared by second cleaning method compared to first cleaning method. Characterization of these two sets of samples using X-ray photoelectron spectroscopy (XPS) has shown excellent contamination removal for the second cleaning method. This modification is believed to be due to reduction of carbon contamination.  相似文献   
92.
An effective method for the simultaneous determination of docosahexaenoic acid and eicosapentaenoic acid in common seafood by gas chromatography was developed and validated. Total docosahexaenoic acid and eicosapentaenoic acid were extracted from seafood by ultrasonic cell crusher assisted extraction and methyl esterified for gas chromatography analysis in the presence of the internal standard. The linearity was good (r > 0.999) in 9.59 ∼ 479.5 μg/mL for docosahexaenoic acid and 9.56 ∼ 477.8 μg/mL for eicosapentaenoic acid. The intrarun and interrun precisions were both within 4.8 and 6.1% for the two analytes, while the accuracy was less than 5.8%. The developed method was applied for determination of docosahexaenoic acid and eicosapentaenoic acid in six kinds of seafood. The result showed the content of docosahexaenoic acid and eicosapentaenoic acid was all higher than 1 mg/g in yellow croaker, hairtail, venerupis philippinarum, mussel, and oyster. Our work may be helpful for dietary optimization and production of docosahexaenoic acid and eicosapentaenoic acid.  相似文献   
93.
The objective of the study was to further develop a novel cleaning technique for reverse osmosis in reclamation of municipal secondary effluent. This technique is a new backwash method via direct osmosis (DO) by intermittent injection of the high salinity (HS) solution without stopping of high pressure pump and it is environment and membrane friendly technique. In the study, DO-HS trials were carried out with a UF-RO pilot system which was operated on site with the secondary treated effluent as the raw feed. Different operating conditions for DO-HS treatment in the actual process were investigated. It was found that the operation for implementation of the DO-HS cleaning technique developed was easy. For the first time, the actual profiles of HS concentration, DO backwash flow rate, brine flow rate and permeate pressure during DO-HS treatment have been demonstrated. It was observed that turbidity of the brine stream during DO-HS treatment at 3 NTU was 5 times higher than that before DO-HS treatment. The results from this study have confirmed the previous hypothesis with DO-HS treatment that there would be a strong driving force for DO backwash to lift and sweep the foulants from the membrane surface which would be carried over to the brine. The optimal plant operating conditions in terms of RO feed flow rate, HS concentration and HS injection time are ready for the DO-HS method to be adopted and validated in a long-term continuous plant operation.  相似文献   
94.
In this article, we report on the viscoelastic and thermal properties of agarose–polyacrylamide (PAAm) interpenetrating polymer hydrogels (IPHs) and semi‐IPHs as a function of agarose concentration and PAAm crosslinking degree. The results demonstrated that the agarose is able to gel in the presence of crosslinked and linear IPHs. In addition, the reticulation of PAAm in the presence of agarose is confirmed for the case of IPHs giving rise to systems with dimensional stability at high temperatures. The formation of a fully IPH was ascertained at low agarose concentrations. A study of the morphology and nanoscale elasticity of the different systems has been carried out with atomic force microscopy/ultrasonic force microscopy (UFM). UFM data provide further evidence of interpenetration, allowing us to visualize—if present—phase‐separated domains with nanoscale resolution for the various crosslinking degrees and PAAm and agarose concentrations used during the formation of the IPHs. © 2010 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2010  相似文献   
95.
预试环中H_2及掺杂甲烷的辉光放电清洗   总被引:1,自引:1,他引:0  
本文给出了在预试环中产生和维持辉光放电的基本参数、氢气(H_2)及氢气掺杂甲烷(H_2/CH_4)辉光放电清洗过程中的质谱分析结果以及氢气辉光放电清洗处理后的样品表面SIMS(二次离子质谱)结果,并进行了讨论。  相似文献   
96.
Water is always present in laser processing in air: as vapor, condensate or adsorbate. Water is the working environment in underwater processing—but it can also be added on purpose to gain better results: to avoid redeposition of debris, to cool the material, to increase plasma pressure or to conduct light. Water can also act as a chemical reagent. The first part of the article will review the advantages and disadvantages of laser processing in the presence of water, light transmission by water, and the two most mature methods of water-assisted laser processing: steam cleaning and shock processing.  相似文献   
97.
一类弱散射界面背向散射超声散斑一阶统计特性   总被引:4,自引:0,他引:4       下载免费PDF全文
对超声入射至分布有细小凹坑的界平面,这一类弱散射界面背向散射所形成的超声散斑的一阶统计特性进行了研究.在假设条件下,理论分析的结果表明,空间超声散斑的振幅服从Rice分布,而它们的相位概率密度函数是一个包含Gauss分布函数和Gauss概率积分函数的复合函数.当细孔密度非常大时,超声散斑的振幅就趋于Rayleigh分布.应用作者建立的由计算机控制扫描的实验系统,对这一类弱散射界面反射超声散斑的振幅分布进行了测量.实验结果表明,理论分析的结果是正确的,由此,所作的假设条件也是成立的. 关键词: 弱散射 超声散斑 统计特性  相似文献   
98.
The intermediate regime of optoacoustic interaction, similar to the Bragg one, with Rayleigh surface ultrasonic waves in gyrotropic planar waveguides is studied. A system of equations of bound waves is presented that describes planar optoacoustic interaction in the intermediate, Raman-Natoh, and Bragg regimes of light diffraction by surface ultrasonic waves. It is shown that the optical activity of a wavequide film favors the incident light energy pumping to diffracted light for a TE-polarization wave and decelerates this process for an incident TM-polarization wave. Mozyr' State Pedagogical Institute, 28, Studencheskaya St., Mozyr', 247760, Belarus. Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 64, No. 3, pp. 412–416, May–June, 1997.  相似文献   
99.
探测超声微振动的激光外差干涉仪   总被引:1,自引:0,他引:1  
激光超声是一项新兴的技术,可应用于非接触检测。本文作者研制的探测超声微振动的激光外差干涉仪,该装置具有结构简单,不必采用复杂的反馈回路,只要采用简单的滤波就可以消除外界环境引起的干扰,更重要的是它的测量结果与干涉仪的初相无关,为实际应用提供了很大方便。  相似文献   
100.
The effect of continuous sonication on the kinetics of iodine formation in aqueous iodide solutions was studied in the presence of air and argon at two frequencies, 20 and 900 kHz. Most workers in this area assume that frequency has a negligible effect on sonochemical reactions. The present results indicate, however, that there is a significant effect in the above solutions. The rate of sonochemical oxidation of iodide in aqueous solution is 3.1 times greater in presence of air than argon at 900 kHz, in contrast to the situation at 20 kHz, where the ratio is 0.9 A 900 kHz apparatus was specially designed to make it possible to measure the absolute acoustic power delivered into the solution. The rate of oxidation per unit power in this new 900 kHz apparatus can be more than 30 times greater than that at 20 kHz for the oxidation of iodide in the presence of air.  相似文献   
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